Waste Gas Treatment with UPTIMUM (burn/wet) at the Point-Of-Use
UPTIMUM is a process waste gas treatment-system using burn/wet technology. The product name UPTIMUM refers to the term „Uptime“ underlining the high tool availability. The tool can be applied to different applications.
Operating Principle of the UPTIMUM-Systems
Process waste gases are induced through a maximum of six separate inlets. Depending on the chemical composition of the waste gases, various reactions take place (oxidation, reduction, pyrolysis). A fluid wall/film prevents corrosion and deposition of particles in the reactor. In the washing column next to the reactor, soluble components are absorbed and particles suspended. The scrubbing liquid cools down and neutralises combustion products such as hydrogen halides and all remaining residual gases meet the strict German standards for air pollution law (TA Luft).
The following equipment options are available for all UPTIMUM systems:
- Power Supply: 3 x 400 V/50 Hz or 3 x 208 V/60 Hz
- Fuel Gas: NG, LPG
- Oxidant: O2, CDA
- Closed-loop system: Water, Lye
- Heated feed lines and inlets
- Signal Tower
- Drip Pan
- Earthquake Safety Kit
UPTIMUM – Efficient Point-of-Use Waste Gas Treatment of CVD Processes
Unlike the ESCAPE technology, the gases are burnt from top to bottom. UPTIMUM is optimised for up to six independent inlets from CVD process tools of various industry sectors. The system runs on diverse fuel gases and scrubber liquids, with access for operation and maintenance on front and back side. Operation costs and general safety can be optimised with a process tool interface.
- Runs with different fuel gases
- Low water consumption through closed-loop design
- SEMI S2 compliant
- Dimension (W x D x H):
1525 mm x 1050 mm x 2100 mm
- Access to maintenance area on front and back side
- Gas entry: max. 6 x DN25 or 4 x DN 40
UPTIMUM PLUS – Efficient Waste Gas Treatment in the Thinfilm Solar Industry
UPTIMUM PLUS based on the same principle as UPTIMUM, was specifically designed to meet the requirements of processes in photovoltaic Si-thin film manufacturing and is capable of treating larger amounts of hydrogen and NF3 (or F2).